| 7017.10.30 | 00 | Quartz reactor tubes and holders designed for insertion into diffusion and oxidation furnaces for production of semiconductor wafers | X | Free | | 50% |
| 7020.00.30 | 00 | Quartz reactor tubes and holders designed for insertion into diffusion and oxidation furnaces for production of semiconductor wafers | X | Free | | 55% |
| 8480.71.40 | 00 | For the manufacture of semiconductor devices | No. | Free | | Free |
| 8486 | | Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in Note 9 (C) to this chapter; parts and accessories: | | | | |
| 8486.20.00 | 00 | Machines and apparatus for the manufacture of semiconductor devices or of electronic integrated circuits: | No. | Free | | 35% |
| 8486.40.00 | 20 | For assembling semiconductor devices or electronic integrated circuits | No. | | | |
| 8486.40.00 | 30 | For lifting, handling, loading or unloading of boules, wafers, semiconductor devices, electronic integrated circuits and flat panel displays | No. | | | |
| 8519.81 | | Using magnetic, optical or semiconductor media: | | | | |
| 8523.51.00 | 00 | Semiconductor media: | | | | |
| 8541 | | Diodes, transistors and similar semiconductor devices; photosensitive semiconductor devices, including photovoltaic cells whether or not assembled in modules or made up into panels; light-emitting diodes; mounted piezoelectric crystals; parts thereof: | | | | |
| 8541.40 | | Photosensitive semiconductor devices, including photovoltaic cells whether or not assembled in modules or made up into panels; light-emitting diodes: | | | | |
| 8541.50.00 | | Other semiconductor devices | | Free | | 35% |
| 9030.82.00 | 00 | For measuring or checking semiconductor wafers or devices | No. | Free | | 40% |
| 9031.41.00 | | For inspecting semiconductor wafers or devices or for inspecting photomasks or reticles used in manufacturing semiconductor devices | | Free | | 50% |
| 9031.41.00 | 20 | For inspecting photomasks or reticles used in manufacturing semiconductor devices | No. | | | |
| 9031.41.00 | 40 | For inspecting semiconductor wafers or devices: | | | | |
| 9031.49.70 | 00 | For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices | No. | Free | | 50% |
| 9031.80.40 | 00 | Electron beam microscopes fitted with equipment specifically designed for the handling and transport of semiconductor wafers or reticles | No. | Free | | 40% |
