9031.41.00 | | For inspecting semiconductor wafers or devices or for inspecting photomasks or reticles used in manufacturing semiconductor devices | | Free | | 50% |
9031.41.00 | 20 | For inspecting photomasks or reticles used in manufacturing semiconductor devices | No. | | | |
9031.49.70 | 00 | For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices | No. | Free | | 50% |