| 3801.10.10 | 00 | Plates, rods, powder and other forms, wholly or partly manufactured, for manufacturing into brushes for electric generators, motors or other machines or appliances | kg | 3.7% | Free (A,AU,BH, CA,CL,E,IL,J,JO, MA,MX,P,SG) | 45% |
| 3926.20.60 | 00 | Plastic rainwear, including jackets, coats, ponchos, parkas and slickers, featuring an outer shell of polyvinyl chloride plastic with or without attached hoods, valued not over $10 per unit | doz. | Free | | 25% |
| 8444.00.00 | | Machines for extruding, drawing, texturing or cutting man-made textile materials | | Free | | 40% |
| 8444.00.00 | 10 | Texturing machines | No. | | | |
| 8448.20.50 | 10 | Of texturing machines | X | | | |
| 8475 | | Machines for assembling electric or electronic lamps, tubes or flashbulbs, in glass envelopes; machines for manufacturing or hot working glass or glassware; parts thereof: | | | | |
| 8475.21.00 | 00 | Machines for manufacturing or hot working glass or glassware: | | | | |
| 8477.10.30 | 00 | For manufacturing shoes | No. | Free | | Free |
| 8479.89.83 | 00 | Machines for the manufacturing of optical media | No. | Free | | 35% |
| 9031.41.00 | | For inspecting semiconductor wafers or devices or for inspecting photomasks or reticles used in manufacturing semiconductor devices | | Free | | 50% |
| 9031.41.00 | 20 | For inspecting photomasks or reticles used in manufacturing semiconductor devices | No. | | | |
| 9031.49.70 | 00 | For inspecting masks (other than photomasks) used in manufacturing semiconductor devices; for measuring surface particulate contamination on semiconductor devices | No. | Free | | 50% |
| 9804.00.15 | | Professional books, implements, instruments and tools of trade, occupation or employment (not including theatrical scenery, properties or apparel, and not including articles for use in any manufacturing establishment, for any other person or for sale), owned and used by him abroad | | Free | | Free |
| 9814.00.50 | 00 | Tea, tea waste and tea siftings and sweepings, all the foregoing to be used solely for manufacturing theine, caffeine or other chemical products whereby the identity and character of the original material is entirely destroyed or changed | X | Free, under bond, as prescribed in U.S. note 1 to this subchapter | Free (AU,BH,CA, CL,IL,JO,MA, MX,P,SG) | Free, under bond, as prescribed in U.S. note 1 to this subchapter |
